The Effect of Deposition of Metal Charge Compensation Coating on Surface Morfology of Samples for SEM
dc.contributor.author | Andršová Zuzana | cs |
dc.contributor.author | Kejzlar Pavel | cs |
dc.contributor.author | Voleský Lukáš | cs |
dc.contributor.author | Petrů Michal | cs |
dc.date.accessioned | 2020-06-08T09:35:41Z | |
dc.date.available | 16-04-2019 | en |
dc.date.available | 2020-06-08T09:35:41Z | |
dc.date.issued | 2018-01-01 | cs |
dc.date.updated | 15-11-2019 | en |
dc.format.extent | 6 | cs |
dc.identifier.isbn | 978-80-87294-81-9 | cs |
dc.identifier.uri | https://dspace.tul.cz/handle/15240/155284 | |
dc.language.iso | eng | cs |
dc.publisher | TANGER Ltd | cs |
dc.publisher.city | Ostrava | cs |
dc.relation.ispartof | (2018) NANOCON 2017 - Conference Proceedings, 9th International Conference on Nanomaterials - Research and Application | en |
dc.relation.ispartofseries | 1 | cs |
dc.riv.kontrolni-cislo | 192065082 | cs |
dc.riv.kontrolni-cislo | 192065671 | cs |
dc.riv.specifikace | RIV/46747885:24210/18:00005873!RIV19-MSM-24210___ | cs |
dc.riv.specifikace | RIV/46747885:24620/18:00005873!RIV19-MSM-24620___ | cs |
dc.subject | Atomic force microscopy | cs |
dc.subject | Crystal atomic structure | cs |
dc.subject | Deposition | cs |
dc.subject | Gold coatings | cs |
dc.subject | Nanostructured materials | cs |
dc.subject | Silicon wafers | cs |
dc.subject | Charge compensation | cs |
dc.subject | Coating material | cs |
dc.subject | Conductive surfaces | cs |
dc.subject | Deposition of metals | cs |
dc.subject | Deposition Parameters | cs |
dc.subject | Magnetic sputtering | cs |
dc.subject | Quantita | cs |
dc.title | The Effect of Deposition of Metal Charge Compensation Coating on Surface Morfology of Samples for SEM | cs |
local.citation.epage | 848-853 | cs |
local.citation.spage | 848-853 | cs |
local.event.location | Brno | en |
local.identifier.publikace | 5873 | |
local.identifier.wok | 452823300141 | en |