Influence of Bias Voltage and CH4/N2 Gas Ratio on the Structure and Mechanical Properties of TiCN Coatings Deposited by Cathodic Arc Deposition Method

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dc.contributor.authorBakalova Totkacs
dc.contributor.authorKejzlar Pavelcs
dc.contributor.authorPetkov Nikolaycs
dc.contributor.authorKashkarov Egor Borisovichcs
dc.contributor.authorBahchedzhiev Hristocs
dc.date.accessioned2020-06-08T09:39:44Z
dc.date.available03-28-2019en
dc.date.available2020-06-08T09:39:44Z
dc.date.issued2019cs
dc.date.updated09-02-2020en
dc.format.extent12cs
dc.identifier.doi10.1007/s11665-018-3754-3
dc.identifier.issn1059-9495cs
dc.identifier.urihttps://dspace.tul.cz/handle/15240/155638
dc.language.isoengcs
dc.publisherSpringer New York LLCcs
dc.publisher.cityNew Yorkcs
dc.relation.ispartofJournal of Materials Engineering and Performanceen
dc.relation.ispartofseries1cs
dc.relation.urihttps://link.springer.com/content/pdf/10.1007/s11665-018-3754-3.pdfcs
dc.riv.kontrolni-cislo192149569cs
dc.riv.specifikaceRIV/46747885:24210/19:00006250!RIV20-MPO-24210___cs
dc.subjectcathodic arc depositioncs
dc.subjectnanohardnesscs
dc.subjectTiCN coatingscs
dc.subjectXRD analysiscs
dc.titleInfluence of Bias Voltage and CH4/N2 Gas Ratio on the Structure and Mechanical Properties of TiCN Coatings Deposited by Cathodic Arc Deposition Methodcs
local.citation.epage343-354cs
local.citation.spage343-354cs
local.identifier.publikace6250
local.identifier.wok455266500033en
local.relation.issue1cs
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