Thin SiNC/SiOC Coatings with a Gradient of Refractive Index Deposited from Organosilicon Precursor

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dc.contributor.authorFijalkowski Mateuszcs
dc.date.accessioned2021-01-14T18:02:43Z
dc.date.available17-17-2020en
dc.date.available2021-01-14T18:02:43Z
dc.date.issued2020-01-01cs
dc.date.updated01-00-1970en
dc.format.extent23cs
dc.identifier.doidoi:10.3390/coatings10080794
dc.identifier.issn2079-6412cs
dc.identifier.urihttps://dspace.tul.cz/handle/15240/158432
dc.language.isoengcs
dc.relation.ispartofCoatingsen
dc.relation.ispartofseries0cs
dc.relation.urihttps://www.mdpi.com/journal/coatings/special_issues/ceram_coatcs
dc.subjectthin filmscs
dc.subjectsilicon carbon-nitridecs
dc.subjectsilicone carbon-oxidecs
dc.subjectPECVD methodcs
dc.subjectinhomogeneous optical filterscs
dc.subjectgradient interference filterscs
dc.subjectorganosilicon precursorscs
dc.titleThin SiNC/SiOC Coatings with a Gradient of Refractive Index Deposited from Organosilicon Precursoren
dc.titleThin SiNC/SiOC Coatings with a Gradient of Refractive Index Deposited from Organosilicon Precursorcs
local.identifier.publikace7759
local.relation.issue10,794cs
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