Thick platinum films as low temperature thermometers

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dc.contributor.author Bat'ko, Ivan
dc.contributor.author Somora, Miloš
dc.contributor.author Vanický, Dušan
dc.contributor.author Flachbart, Karol
dc.contributor.author Matěj, V.
dc.contributor.author Pavlík, Vladimír
dc.date.accessioned 2016-07-08
dc.date.available 2016-07-08
dc.date.issued 1992
dc.identifier.issn 0011-2275
dc.identifier.uri https://dspace.tul.cz/handle/15240/16568
dc.identifier.uri https://www.sciencedirect.com/science/article/abs/pii/001122759290305T?via%3Dihub
dc.description.abstract Resistance measurements of thick platinum films between 4.2 and 300 K are reported. The thick films were prepared by standard screen-printing techniques. The properties of the films make them suitable for low temperature thermometry. In the temperature range 77-300 K experimental data are fitted using a quadratic fit with an error in temperature of less than 0.2%. © 1992. en
dc.format text
dc.language.iso en
dc.relation.ispartof Cryogenics
dc.source j-scopus
dc.source j-wok
dc.subject platinum resistance thermometers en
dc.subject thermometers en
dc.subject thick films en
dc.title Thick platinum films as low temperature thermometers en
dc.type article
dc.identifier.doi 10.1016/0011-2275(92)90305-T
local.relation.volume 32
local.relation.issue 7
local.identifier.wok A1992JB72300015
local.identifier.scopus 2-s2.0-0042010881
local.faculty Faculty of Mechatronics, Informatics and Interdisciplinary Studies
local.citation.spage 683
local.citation.epage 684
local.identifier.coden CRYOA
local.department Department of Electrical Engineering
local.access access
local.note nefunguje RIV


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