The influence of Kanthal wire surface defects on the formation of Si nanolayer deposited by PVD method

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dc.contributor.authorSzczpynski Michal Marekcs
dc.contributor.authorSzczypiński Mieczysławcs
dc.contributor.authorReszka Kazimierzcs
dc.date.accessioned2020-06-08T09:27:50Z
dc.date.available07-45-2018en
dc.date.available2020-06-08T09:27:50Z
dc.date.issued2018cs
dc.date.updated10-33-2019en
dc.format.extent6cs
dc.identifier.doi10.1515/msp-2018-0038
dc.identifier.issn2083-1331cs
dc.identifier.urihttps://dspace.tul.cz/handle/15240/155063
dc.language.isoengcs
dc.publisherDe Gruytercs
dc.relation.ispartofMaterials Science-Polanden
dc.relation.ispartofseries1cs
dc.relation.urihttps://content.sciendo.com/view/journals/msp/36/2/article-p264.xmlcs
dc.riv.kontrolni-cislo192065046cs
dc.riv.specifikaceRIV/46747885:24210/18:00005644!RIV19-MSM-24210___cs
dc.subjectAluminum alloyscs
dc.subjectCathodescs
dc.subjectChromium alloyscs
dc.subjectCorrosioncs
dc.subjectCorrosion protectioncs
dc.subjectEnergy dispersive spectroscopycs
dc.subjectIon beamscs
dc.subjectIron alloyscs
dc.subjectOxide filmscs
dc.subjectPhysical vapor depositioncs
dc.subjectSurface defectscs
dc.subjectTernary alloyscs
dc.subjectWirecs
dc.subjectEnergy dispersive spectroscopies (EDS)cs
dc.subjectExcs
dc.titleThe influence of Kanthal wire surface defects on the formation of Si nanolayer deposited by PVD methodcs
local.citation.epage264-269cs
local.citation.spage264-269cs
local.identifier.publikace5644
local.relation.issue2cs
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