Fluorine doped titanium dioxide fi lms manufactured with the help of plasma enhanced chemical vapor deposition technique

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dc.contributor.authorSobczyk-Guzenda Annacs
dc.contributor.authorOwczarek S.cs
dc.contributor.authorWojciechowska Annacs
dc.contributor.authorBatory Damiancs
dc.contributor.authorFijalkowski Mateuszcs
dc.contributor.authorGazicki-Lipman M.cs
dc.date.accessioned2018-09-25T12:15:49Z
dc.date.available2018-09-25T12:15:49Z
dc.date.issued2018cs
dc.description.abstractIn this work, a manufacture of TiO2 coatings doped with fluorine, in a concentration range of 0.6 to 6.7 at.%, is presented. The coatings were deposited onto silicon and quartz substrates with the help of radio frequency plasma enhanced chemical vapor deposition technique. They were characterized with regard to their elemental composition, chemical structure, phase composition, surface topography, optical properties, photo-wettability and bactericidal properties. For that purpose, such analytical techniques as X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy, grazing incidence X-ray diffraction (GIXRD), scanning electron microscopy, atomic force microscopy, ultraviolet–visible absorption spectroscopy and variable angle spectroscopic ellipsometry were used. GIXRD analysis of the coatings doped with fluorine shows their amorphous structure. Apart from TiO2 bonding, FTIR and XPS analyses of the films reveal a presence of TiF and OF bonds. Surface morphology studies indicate an increasing number of surface defects along with growing fluorine content. The coatings exhibit promising optical properties with some of them showing a super-hydrophilic effect as well. On the other hand, the bactericidal effect of fluorine doped TiO2 coatings is weaker than that of plain TiO2.en
dc.format.extent10cs
dc.identifier.doihttps://doi.org/10.1016/j.tsf.2018.01.060
dc.identifier.issn0040-6090cs
dc.identifier.urihttps://dspace.tul.cz/handle/15240/31442
dc.identifier.urihttps://www.sciencedirect.com/science/article/pii/S0040609018300762?via%3Dihub
dc.language.isoengcs
dc.relation.ispartofseries1cs
dc.relation.urihttps://ac.els-cdn.com/S0040609018300762/1-s2.0-S0040609018300762-main.pdf?_tid=3086e7aa-1648-11e8-82a9-00000aab0f27&acdnat=1519136174_e4e1d818363c30913d51df31e24dca48cs
dc.subjectFluorine-doped titanium dioxidecs
dc.subjectRadio-frequency chemical vapor depositioncs
dc.subjectChemical structure Amorphouscs
dc.subjectSuper-hydrophilicitycs
dc.subjectRefractive indexcs
dc.subjectSurface morphologycs
dc.titleFluorine doped titanium dioxide fi lms manufactured with the help of plasma enhanced chemical vapor deposition techniqueen
dc.titleFluorine doped titanium dioxide films manufactured with the help of plasma enhanced chemical vapor deposition techniquecs
local.citation.epage87cs
local.citation.spage78cs
local.identifier.publikace4905
local.identifier.wok000426426200012en
local.relation.issue3cs
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